Profile of the liquid film wetting a channel
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چکیده
منابع مشابه
Multi-curvature liquid meniscus in a nanochannel: evidence of interplay between intermolecular and surface forces.
We examined the formation of a multiply curved meniscus inside rectangular nanochannels, whose width ranges from 50 to 800 nm at a constant height of 200 nm. When the channel width is smaller than approximately 400 nm under partial wetting conditions, a distinct multi-curvature meniscus was observed at the advancing front with an edge disjoined from the wall. In contrast, a typical pre-wetting ...
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Core-annular flow is common in nature, representing, for example, how streams of oil, surrounded by water, move in petroleum reservoirs. Oil, typically a nonwetting fluid, tends to occupy the middle (core) part of a channel, while water forms a surrounding wall-wetting film. What is the thickness of the wetting film? A classic theory has been in existence for nearly 50 years offering a solution...
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Motivated by the development of lubricant-infused slippery surfaces, we study a sessile drop of a nonvolatile (ionic) liquid which is embedded in a slowly evaporating lubricant film (n-decane) on a horizontal, planar solid substrate. Using laser scanning confocal microscopy we imaged the evolution of the shape of the liquid/liquid and liquid/air interfaces, including the angles between them. Re...
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We consider the deposition of a film of viscous liquid on a flat plate being withdrawn from a bath, experimentally and theoretically. For any plate speed U, there is a range of "thick" film solutions whose thickness scales like U{1/2} for small U. These solutions are realized for a partially wetting liquid, while for a perfectly wetting liquid the classical Landau-Levich-Derjaguin film is obser...
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We report x-ray reflectivity measurements of the internal structure of thin wetting films formed on a silicon substrate from the vapor of a binary mixture of methylcyclohexane ~MC! and perfluoromethylcyclohexane ~PF!. At T530 °C ~below the bulk consolute temperature of Tc'46 °C) variation in the difference in temperature between the substrate and the vapor induces changes in film thickness ~25 ...
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تاریخ انتشار 2017